Applications
Aluminium Oxide (AlOx) PICs bring unique material advantages to next-generation photonic systems. From quantum and AR optics to lasers, LIDAR, and amplification, we unlock new levels of integration, performance, and scalability.
Optical Communications
AlOx PICs unlock compact, wafer-level integration of Erbium-Doped Waveguide Amplifiers (EDWAs), enabling scalable on-chip amplification where fiber amplifiers fall short. With high optical gain, low-loss waveguides, and compatibility with advanced doping techniques and custom pump solutions, AlOx PICs push the boundaries of integrated amplification -ideal for next-gen optical communications systems.
LIDAR
AlOx PICs offer promising advantages for next-generation LiDAR systems. With low optical loss, high power handling, and UV-to-IR transparency, AlOx is well suited for compact, integrated photonic beam steering and signal processing. Its ability to support on-chip amplification and precise optical control makes it a strong candidate for high-resolution, solid-state LiDAR in mobility, robotics, and environmental sensing.
Quantum Technologies
AlOx PICs support a wide range of quantum technologies: from sensing and communication to computing. Their UV transparency enables on-chip beam delivery for ion and atom trapping, while ultra-low loss allows precise control of single photons. With rare-earth doping (AlOx:Er³⁺), they also deliver high optical power for nonlinear processes - all on a scalable photonic platform.
Augmented Reality
AlOx PICs unlock new possibilities for augmented reality (AR) optics by enabling superior transmission in the blue wavelength range - an area where conventional PIC platforms struggle. This makes AlOx especially suited for compact, high-brightness display engines and light routing in AR glasses. Combined with low-loss waveguides and precise on-chip control, AlOx offers a compelling path toward scalable, high-performance photonics for next-generation AR systems.
Integrated Lasers
AlOx PICs enable advances in chip-integrated lasers, especially in the near-UV range. The first 405 nm extended cavity diode laser used AlOx for its excellent optical properties and integration with GaN amplifiers and Vernier feedback. The result: a compact, stable, and efficient laser ideal for UV-sensitive applications in spectroscopy, biotech, and advanced manufacturing.
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